Reticle pod

ABSTRACT

A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.

REFERENCES TO RELATED APPLICATIONS

This is a request for filing a Continuation application, under 37 CFR§1.53(b), of pending prior application Ser. No. 13/562,087, filed Jul.30, 2012 (U.S. Pat. No. 8,612,359 issuing Dec. 24, 2013) which was aContinuation application, under 37 CFR §1.53(b), of prior applicationSer. No. 12/088,120, filed Sep. 11, 2008 (U.S. Pat. No. 8,231,005 issuedJul. 31, 2012) for: RETICLE POD by: Steven Kolbow et al. The entiredisclosure of the prior applications and are considered as being part ofthe disclosure of the accompanying application and is herebyincorporated by reference herein.

This application claims priority to application Ser. No. 13/562,087,filed Jul. 30, 2012 (issuing as U.S. Pat. No. 8,612,359 on Dec. 24,2013), which claims priority to application Ser. No. 12/088,120, filedSep. 11, 2008, now U.S. Pat. No. 8,231,005 issued Jul. 31, 2012; whichalso claims priority to the following U.S. provisional applications:U.S. Application No. 60/720,762, filed 27 Sep. 2005; U.S. ApplicationNo. 60/720,777, filed 27 Sep. 2005; U.S. Application No. 60/720,778,filed 27 Sep. 2005; U.S. Application No. 60/774,391, filed 18 Feb. 2006;and U.S. Application No. 60/774,537, filed 18 Feb. 2006. The entirety ofall of the aforementioned applications are hereby incorporated byreference herein.

FIELD OF THE INVENTION

This invention relates to container for storage, transport, shipping andprocessing of fragile devices such as photomasks, reticles and wafers,and, in particular, this invention relates to protection means,particularly particle control means including support structures forlocating and securing a reticle with means for maintaining a cleanenvironment for the reticle.

BACKGROUND OF THE INVENTION

One of the process steps commonly encountered in the fabrication ofintegrated circuits and other semiconductor devices is photolithography.Broadly, photolithography involves selectively exposing a speciallyprepared wafer surface to a source of radiation using a patternedtemplate to create an etched surface layer. Typically, the patternedtemplate is a reticle, which is a very flat glass plate that containsthe patterns to be reproduced on the wafer. For example, the wafersurface may be prepared by first depositing silicon nitride on itfollowed by a coating of a light-sensitive liquid polymer orphotoresist. Next, ultraviolet (UV) light is shone through or reflectedoff a surface of a mask or reticle to project the desired pattern ontothe photoresist-covered wafer. The portion of the photoresist exposed tothe light is chemically modified and remains unaffected when the waferis subsequently subjected to a chemical media that removes the unexposedphotoresist leaving the modified photoresist on the wafer in the exactshape of the pattern on the mask. The wafer is then subjected to an etchprocess that removes the exposed portion of the nitride layer leaving anitride pattern on the wafer in the exact design of the mask. Thisetched layer, singly or in combination with other similarly createdlayers, represent the devices and interconnects between devicescharacterizing the “circuitry” of a particular integrated circuit orsemiconductor chip.

The industry trend is towards the production of chips that are smallerand/or with a higher logic density necessitating even smaller linewidths on larger wafers. Clearly, the degree of fineness to which thesurface of the reticle can be patterned and the degree to which thispattern can be faithfully replicated onto the wafer surface are factorsthat impact the quality of the ultimate semiconductor product. Theresolution with which the pattern can be reproduced on the wafer surfacedepends on the wavelength of ultraviolet light used to project thepattern onto the surface of the photoresist-coated wafer.State-of-the-art photolithography tools use deep ultraviolet light withwavelengths of 193 nm, which allow minimum feature sizes on the order of100 nm. Tools currently being developed use 157 nm Extreme Ultraviolet(EUV) light to permit resolution of features at sizes below 70 nm. Thereticle is a very flat glass plate that contains the patterns to bereproduced on the wafer.

Typical reticle substrate material is optically clear quartz. Because ofthe tiny size of the critical elements of modern integrated circuits, itis essential that the operative surface of the reticle (i.e. thepatterned surface) be kept free of contaminants that could either damagethe surface or distort the image projected onto the photoresist layerduring processing leading to a final product of unacceptable quality.Typically, the critical particle sizes are 0.1 .mu.m and 0.03 .mu.m forthe non-patterned and patterned surfaces respectively when EUV is partof the photolithography process.

Typically, the patterned surface of the reticle is coated with a thin,optically transparent film, typically of nitrocellulose, attached to andsupported by a frame, and attached to the reticle. Its purpose is toseal out contaminants and reduce printed defects potentially caused bysuch contamination in the image plane. With EUV, however, reflectionfrom the patterned surface is used as opposed to transmission throughthe reticle characteristic of deep ultraviolet light photolithography.At his time, the art does not provide pellicle materials that aretransparent to EUV. Consequently, the reflective photomask (reticle)employed in EUV photolithography is susceptible to contamination anddamage to a far greater degree than reticles used in conventionalphotolithography. This situation imposes heightened functionalrequirements on a container or pod designed to store, transport and shipa reticle destined for EUV photolithography use. Generally, reticles arestored and/or transported within a mini-clean room type environmentcreated within a SMIF container or pod. Such a container typicallyincludes a door and a cover that mates with the door to form ahermetically sealed enclosure for holding the reticle. The door isgenerally designed and equipped with special features and mechanisms toenable interfacing with a process tool for automatic or manual openingof the door and subsequent transfer of the reticle to the process toolenvironment without exposing the reticle to the ambient atmosphere.

Considering the severe impact of particulates on semiconductorfabrication, unnecessary and unintended contact between the reticle andother surfaces during manufacturing, processing, shipping, handling,transport or storage is highly undesirable in view of the susceptibilityof the reticle to damage to the delicate features on the patternedsurface due to sliding friction and abrasion. Secondly, any particulatecontamination of the surface of the reticle could compromise the reticleto a degree sufficient to seriously affect any end product obtained fromthe use of such a reticle during processing. Particles can be generatedwithin the controlled environment containing the reticle duringprocessing, transport and shipping. Sliding friction between the reticleand the container and consequent abrasion is one of the sources ofcontaminating particulates. Such a situation can arise while trying toposition the reticle inside the container or due to relative movementbetween the reticle and the container during transport or shipping. Forexample, a reticle can slide from its position within a reticlecontainer during transport thereby generating particulates. Deformationof the walls of the container can be sufficient to introduce a shift inthe position of the reticle within the container. Such a mispositionedreticle will also likely be misaligned when automatically retrieved fromthe container and positioned into processing equipment leading to an endproduct of unpredictable quality. Shock and vibration of the containercan be transmitted to the reticle and components holding the reticlecausing relative movement and associated particle generation. There isalso the possibility that the reticle or pellicle might be scratched orcrack under such conditions. Of course, the source of particulates canbe airborne particulates settling on the reticle. Typically, thisproblem is mitigated by utilizing hermetically sealed SMIF containers tocreate and maintain a controlled environment around the reticle.

This discussion is equally applicable to containers designed totransport and/or store semiconductor wafer substrates and reticles thatare destined for non-EUV related semiconductor fabrication. For exampleFOUPS (acronym for front opening unified pod) and FOSBS (acronym forfront opening shipping box), and SMIF (acronym for sealed mechanicalinterface).

Recognizing the need for a controlled environment around the wafer,particularly during storage, processing and transport, prior art hasevolved approaches to securely hold a reticle in a fixed position withinthe reticle container during operations involved in the storage,shipment and transport of the reticle. The most common approach involvesproviding supports, on a bottom surface or door of the pod, that contactthe reticle patterned surface and hold it in a substantially planarconfiguration with respect to a surface of the container. Very often,the holding supports are augmented with one or more pressing members,extending from the cover or shell of the pod, that contact the reticleon a surface opposite the patterned surface. While this arrangement mayserve to restrain movement of the reticle perpendicular to the patternedsurface, it is ineffective to hold the reticle against translationalmovement in the plane of the patterned surface. In this regard, theprior art discloses limiting structures disposed along the periphery ofthe reticle all being effective to limit the lateral motion of thereticle. The prior art attempts to securely hold the reticle in thecontainer also extend to providing a latch in combination with all ofthe above structural members. The latch is designed to hold the coverfirmly pressed shut against the door or base thereby causing thepressing members to firmly bear down against the reticle. The pressingmembers may be made of resilient material or mounted at the end ofcantilevered arms extending from the cover so that the pressing memberscan make contact and press against the reticle surface progressively asthe cover is brought into engagement with the door. The cantileveredarrangement is purported to allow the application of a compliant andcontrolled force to the reticle by the reticle supports. Such acompliant and controlled force is said to firmly secure the reticlewithin the container without excessive forces on or deformation of thereticle, even under circumstances where the container may be slightlydeformed. It will become readily apparent to one of ordinary skill inthe art that these structures will not prevent relative sliding betweenthe reticle and the support members, the limiting structures and thepressing members. This is particularly true where the container islikely to be subjected to shock and vibration loading. Sliding causesabrasion of the reticle surface and generates particulates.

In recognition of this problem, prior art containers include posts,mounted to the door of the container, for supporting the four respectivecorners of a reticle. Each corner of the post includes beveledconcavities having sloped surfaces at right angles to each other. When areticle is lowered into the reticle supports, there will be a singlehorizontal plane where the edge of the reticle lies in contact with eachsloped surface of the beveled concavities. The reticle will quickly,easily and repeatably locate in this “single solution” position as aresult of the weight of the reticle and low friction between the reticleedges and surfaces of the beveled concavities. The sloped surfaces ofeach beveled concavity is brought into engagement with a chamfer arounda lower edge of the reticle so that the reticle is securely supported atits four corners without the reticle support coming into contact with anupper or lower surface of the reticle, or vertical edges of the reticle.The pressing members may include beveled concavities inverted withrespect to the beveled concavities on the reticle supports so that oncea reticle is located in the reticle supports, coupling the containercover with the container door will cause the sloped surfaces of eachbeveled concavity to engage a chamfer around an upper edge of thereticle so that the reticle is sandwiched between the reticle supportand pressing members at its four corners so that the reticle is heldsecurely in position during transport of the container and/or a shock tothe container.

Some SMIF containers include posts, mounted to the door or base of thecontainer, for supporting the four respective corners of a reticle. Eachcorner of the post may include beveled concavities having slopedsurfaces at right angles to each other. When a reticle is lowered intothe reticle supports, there will be a single horizontal plane where theedge of the reticle lies in contact with each sloped surface of thebeveled concavities. The reticle will quickly, easily and repeatablylocate in this “single solution” position as a result of the weight ofthe reticle and low friction between the reticle edges and surfaces ofthe beveled concavities. The sloped surfaces of each beveled concavityis brought into engagement with a chamfer around a lower edge of thereticle so that the reticle is securely supported at its four cornerswithout the reticle support coming into contact with an upper or lowersurface of the reticle, or vertical edges of the reticle. The pressingmembers may include beveled concavities inverted with respect to thebeveled concavities on the reticle supports so that once a reticle islocated in the reticle supports, coupling the container cover with thecontainer door will cause the sloped surfaces of each beveled concavityto engage a chamfer around an upper edge of the reticle so that thereticle is sandwiched between the reticle support and pressing membersat its four corners so that the reticle is held securely in positionduring transport of the container and/or a shock to the container.

The SMIF containers of the prior art do not minimize contact with thereticle as a whole. In effect, the support arrangements permitsubstantial sliding contact between the reticle support structures andthe reticle before the reticle is brought into position within thecontainer. All such contact may generate particulates and/or affect thepattern etched in the reticle. Additionally, prior art attempts tosecurely support the reticle in a fixed position within the containerintroduce additional contacts with the reticle that are likely to causeadditional scraping and abrasion of the reticle as it is brought intoand out of engagement with the restraints as the reticle is placed inand removed from the container.

The problem of particle generation within the microenvironment isexacerbated when the container is used to ship the reticle. Such acontainer will encounter diverse operational conditions. One of theoperational hazards is that the container will be subjected to shock andvibration loading tending to dislodge the reticle from its securedposition within the container. The container could also deform under theimpact thereby causing the internal structures attached to the reticleto move and thereby causing the reticle to be misaligned within thecontainer, hi this regard, isolation of the container from shock, asopposed to isolation of the reticle from the container, is an importantconsideration.

Particle settling is another problem to be considered. It is desirablethat particulates that are generated or are otherwise introduced withinthe controlled environment cannot easily settle on the reticle. In thisregard, it is preferable not only to have a minimal volume for theenvironment within which the reticle is carried and which has to becontrolled to avoid particulate contamination but it is also desirablethat the air in the controlled volume remain relatively static. Suddenpressure changes or large pressure changes can cause a sudden evacuationor injection of air into the controlled volume leading to turbulence. Afilter surface or a wall of the container deflecting in response tolarge and sudden pressure differences can cause a pressure wave insidethe controlled volume leading to particulate migration.

Another challenge to be overcome is the fact that even with a controlledenvironment, migration of particulates that may be present inside thecontrolled environment is still possible due to pressure changes of theair trapped in the controlled environment or turbulence of the trappedair brought on by rapid movements of the container or by disturbing thetrapped air volume. For example, thin walled SMIF pods may experiencewall movement due to altitude related pressure changes causing thetrapped air inside the controlled environment to be displaced.Temperature changes can set up convection currents within the container.Dimensional changes of the container and its components can compromisethe functioning of support and retaining mechanisms leading to wafermisalignment or warping of the substrate carried within the container.Dimensional changes of the container wall due to pressure fluctuationscan lead to compromising the sealing between cover and door of thecarrier and incursion of particulates within the carrier. Prior artapproaches contemplate a breathing apparatus between the externalenvironment and the internal controlled volume of air. The breathingapparatus provides a path for the air to flow. A filter interposed inthe path is expected to provide a barrier to incursion of particulatesfrom the external environment into the controlled environment of thecarrier. However, as noted above, the reticle used in a EUVphotolithography process has very fine and delicate features so thecritical particle sizes are only of the order of 0.1 [mu]m and 0.03[mu]m for the non-patterned and patterned surfaces of the reticlerespectively. At such low particle sizes, a filter would require a veryfine pore size causing a considerable resistance to fluid flow across itthereby necessitating a larger filter surface area. The alternative to alarger filter surface area is a slower response to sudden pressurechanges such as those encountered in shipping the container. Both ofthese are not preferred alternatives because one of the objectives ofreticle SMIF pod design is to keep the controlled volume to a minimal soit can be effectively sealed against incursion of particulates.Minimizing the controlled volume within which the reticle is positionedwhilst providing for a large filter area to achieve pressureequalization within the controlled volume are inconsistent objectives.

Typically, prior art controlled environment is created by interposing aseal between the door and cover. However, very often the seal is made ofan elastomeric material which, can be in and of itself a source ofparticulates or contamination. Moreover, the prior art attempts tocreate a seal using elastomeric seals requires structures, such asgrooves and raised tabs for example, which may provide a path for theparticulates to enter the inner controlled environment.

Notwithstanding their widespread use, it is generally accepted in theart that such structures present interstices which are not easy to cleanwhen cleaning the pod thereby potentially retaining chemicals andparticulates from the runoff cleaning solution.

What is needed is a reticle containment system that provides maximumprotection for the reticle from particles and contamination by providingstable and secure support and a controlled environment. This shouldinclude a reticle pressure equalization system that effectivelyequalizes pressure between an internal controlled environment of thecarrier and the air external to the carrier without incursion orexcursion of air from the controlled environment and with minimalturbulence of the air already present within the controlled environment.What is also needed is a sealing system that does not utilize any formof a particulate generating material.

SUMMARY OF THE INVENTION

A reticle pod having a base or door cooperating with a cover to form anenclosure for containing a reticle is disclosed. The pod having reticleprotection means including reticle positioning and support means andenvironmental control means. The reticle positioning and support meansfacilitating and forming part of the environmental control means.

In one embodiment, the subject reticle is generally rectangular, mayhave a patterned surface, and is positioned on a support structuremounted to a base or the door of the pod utilizing a plurality ofpositioning spherical balls or defining the position of the reticle onthe base or door. The reticle can be positioned to a seating position byspherical balls or bevel surfaces located proximate the corners of thepod base or door and configured to position the reticle by tangentiallycontacting the reticle edges proximate the corners of the reticle.Locating the reticle with minimal contact area serves to reduce internalparticle generation. Embodiments of the invention may also includereticle retainers mounted to the cover. The retainers may be sphericalballs, which contact the reticle surface at a point. In otherembodiments, the tangential point contact at the corners may be made bystructures other than the spherical balls.

According to an embodiment of the invention, the reticle is located andsecured within the SMIF reticle pod container by securing the reticlebetween two sets of projections that impart a rounded point contact onthe reticle. In one embodiment, the projections may comprise sphericalballs. The first set of spherical ball projections is provided on thebase and contacts one surface of the reticle, usually the patternedsurface. The second set of spherical ball projections is mounted to thecover of the pod and generally contacts the non-patterned or chuckingsurface of the reticle. Supporting and retaining the reticle in thismanner minimizes contact between the reticle and the pod and allowsflexibility of contact material. The spherical balls mounted on the doorand upon which the reticle rests, are sized to provide a thin gapbetween the reticle patterned surface and the surface of the door. Apreferred material for the spheres is polyamide-imide. The componentsare fabricated to tolerances that preclude contact between the reticleand the interior surface of the door, yet provides a gap that is narrowenough to present a diffusion barrier that prevents particle migrationinto the gap and onto the critical area of the reticle. The pod isshaped to minimize internal volume thereby reducing the amount of airneeded to be transferred during pressure equalization.

In another embodiment of the invention, a dual containment pod comprisesa first or inner pod, also known as a cassette, that is contained in asecond or outer pod or package, known as a reticle SMEF pod. The baseand top cover of the inner pod may mate together at cooperating flatsurfaces to provide sealing. Such surfaces may be polished or ultraplanar metal surfaces. The base may be formed primarily or exclusivelyof metal with the cover having a ring metal insert attached therein forproviding the two sealing surfaces. Preferably, the polished metalsurface of the base extends under the reticle seating position and isspaced from the reticle providing a gap of 0.003 to 0.007 inchespreferably 0.004 to 0.005 inches between the reticle and the polished orultra planar central metal surface of the base. Thus, the exteriorsealing surface of the base may be formed simultaneously with thediffusion barrier between the reticle and base, minimizing manufacturingcosts and also minimizing the foot print of the inner pod. The outer podcan comprise a cover portion and a door that seals and latches to thecover portion.

A diffusion filter utilizing only a pair of opposing planar surfaces,such as plates, that may be positioned on the top cover for providingpressure equalization on either of the pods. Such filter may comprise apath through opposing surfaces having a gap of a few thousandths of aninch. The pathway will extend tortuously from interior the pod toexterior the pod. The filter may be fabricated by laser welding a coverpanel on a base piece that has a groove a few thousandths thick formedtherein. The two pieces are place in contact with one of the two piecespreferably transparent or translucent and the other opaque or ofsufficient opacity to absorb laser energy. The laser beam is transmittedthrough the transparent piece to the other piece where it is absorbedheating the juncture of the two pieces at that point welding themtogether. Such a filter does not utilize filter media such as wovenmaterials, fabrics, sintered material or the like and the potential forparticulate generation associated with such media is eliminated.

Another embodiment may also include a series of latches that latch thebase or door of the pod to the cover and provide a uniform clampingforce around the pod perimeter. The spherical balls mounted on the baseor door and upon which the reticle rests are sized to allow a specifieddistance between the reticle patterned surface and the surface of thedoor. This layer presents a diffusion barrier to prevent particlemigration to the critical area of the reticle. Another configuration ofthe invention may include continuous and complementary “flat” surfacesnear the perimeter of the door and cover respectively. Upon mating thecover with the door, the flat surfaces abut on each other creating aseal to prevent migration of particulates into the interior of the podfrom an environment external to the pod thereby eliminating the need fora traditional elastomeric seal.

In still another embodiment of the invention, a first or inner pod, alsoknown as a cassette, is contained in a second or outer pod or package.The outer pod may be what is known in the art as a standard mechanicalinterface (SMIF) pod. The inner pod has a top cover that mates with abase to form an enclosure for protectively containing a reticle or mask.The top cover of the inner pod is provided with at least one apertureadapted to receive a locator pin having a tapered surface such as afrustum or cone on one end. The locator pin is configured and positionedfor retractable engagement between the tapered surface and an edge of areticle positioned within the enclosure of the inner pod. In oneconfiguration, the top cover is fitted with a plurality of such locatorpins, and the outer package is designed to engage the pins upon assemblyof the outer package. As the outer package is brought into engagementwith the cover of the inner pod, the locator pins are simultaneouslyengaged and pushed into the inner pod so that the tapered surface of thepins contact the upper edges of the reticle causing the reticle to beurged into proper lateral position within the enclosure. An elastomericpad attached to the top cover portion of outer pod may be used to engagethe pins and push the pins inward. Other elastomeric pods may contactthe top surface of the top cover of the inner pod.

In another embodiment, a pair of spring rollers are mounted on the dooror base at opposed corners of the pod. The spring rollers providehorizontal reticle alignment with minimal abrasion.

In another embodiment a spring clamp mounted on the cover for keepingthe reticle engaged with the spherical projections. Li an exemplaryembodiment, each spring clamp is mounted to the cover at a first end andis provided with a spherical retention projection at an opposed end. Inan alternate embodiment, the spherical retention projection may be aspherical ball, in which the spring clamp holds the spherical ballagainst the reticle. The stiffness of the spring is selected to providea minimal deflection of the spring in the horizontal direction, i.e.along the surface of the reticle when it is supported in the container.The permissible deflection is primarily in a vertical direction andnormal to the patterned surface of the reticle thus providing reticleretention force to retain the reticle in position within the sphericalprojections but by making point contact with the reticle surfaceopposite the patterned surface. In one embodiment, the inventionfeatures complementary “flat” surfaces one each on the perimeter of thedoor and cover respectively. Upon mating the cover with the door, thetwo surfaces abut against each other creating a seal to preventmigration of particulates into the interior of the pod from anenvironment external to the pod thereby eliminating the need for aconventional electrometric seal.

An advantage of certain embodiments of the invention is to provide aminimal internal volume to reduce the amount of air transferred during,pressure equalization. Moreover, certain embodiments provide a minimalfootprint of the inner pod.

An advantage of certain embodiments of the invention is to minimize thecontact area on the mask with spherical contacts on the bottom and edgecontact on top of the mask.

Another advantage of certain embodiments of the invention is to providea surface to seal cover and base plate eliminating the traditionalelastomeric seal and attendant particle generation. The filter in thecover eliminates the need for traditional filter media.

Another advantage of certain embodiments of the invention is to create adiffusion barrier that protects or prevents particles from migratingonto the quality surface of the mask.

An advantage of the various embodiments of the invention is therestraint of the reticle against movement in and perpendicular to aplane of the patterned surface of the reticle whilst maintaining minimalcontact between the reticle and the container.

Another advantage of certain embodiments of the present invention is tominimize the contact area on the mask with spherical contacts on thebottom and line contact on the edges or edge corner contact on top ofthe mask.

Still another advantage of the present invention is the minimalizationof mask motion within the inner pod during shipment, hi this respect,the present invention provides a means of properly locating a reticlewithin a reticle or mask carrier while constraining relative motionbetween the reticle and the cover both in the plane and perpendicular tothe plane of the patterned surface to thereby minimize surface damage tothe reticle inflicted by shock and vibration induced movement of thereticle during transport and shipment. Also, with the present invention,manual positioning of the reticle within the reticle container or onreticle supports, for example, is not required to be precise because thereticle is precisely centered by the structures that locate the reticle.

Additional advantages and novel features of the invention will be setforth in part in the description which follows, and in part will becomeapparent to those skilled in the art upon examination of the followingor may be learned by practice of the invention. The objects andadvantages of the invention may be realized and attained by means of theinstrumentalities and combinations particularly pointed out in theappended claims.

The invention may be described in its different embodiments as follows.

A container for holding reticles, the reticle having a periphery, a topsurface, a bottom surface, a side surface, four peripheral corners, atop edge and a bottom edge, the container comprising a base having aperiphery, and a top upwardly facing horizontal surface with a pluralityof contact elements extending upwardly, the contact elements having arounded top surface for engaging the reticle on the bottom surface, thebase plate further having a plurality of posts positioned to constrainthe periphery of the reticle, the top surfaces of the contact elementsand the plurality of posts defining a reticle seating position, theupwardly facing horizontal surface further having a sealing surfaceextending around the base at or proximate to the periphery of said base;a cover for engaging the top surface of the base plate along the baseplate periphery, thereby defining an interior for holding the reticle,the cover having a downwardly facing horizontal planar sealing surfacefor cooperating with the sealing surface of the top upwardly facinghorizontal surface of the base to create a seal therebetween when saidrespective surfaces are in contact.

The above container wherein the base plate is formed at least primarilyof metal at the and wherein the top surface is continuously planar andintegral from the sealing surface to below the reticle seating positionof the reticle.

The above containers wherein the downwardly facing horizontal planarsealing surface is formed of metal whereby there seal between the baseand cover is metal to metal.

The above containers wherein the posts are formed of metal and have atop portion with a bevel slanted toward the reticle seating position.

The above containers wherein the posts have a vertical portion that islaterally adjacent the side surface of the reticle when the reticle isseated in the reticle seating position.

The above containers wherein the bevel of each of the plurality of postsdefines the reticle seating position whereby the reticle seats on saidbevel portions.

The above containers wherein each of the plurality of contact elementscomprises a sphere.

The above containers where in the sphere is press fit downwardly into arecess or hole extending downwardly from the top upwardly facinghorizontal surface.

The above containers wherein the bottom plate has a plurality of holesfrom the bottom side of the bottom plate for receiving the spheres eachsphere is held therein by set screws.

The above containers further comprising an outer cover and a doorreceivable within the outer cover to define an interior, the outer coverand outer base sized to receive the above containers.

The above containers wherein the cover comprises a plurality ofvertically moveable reticle posts slidably positioned in the cover, theposts positioned to engage the top edge of the reticle.

The above containers wherein the each of the moveable reticle posts areresiliently positioned in the cover.

The above containers wherein each of the moveable reticle posts has abeveled portion to engage the upper edge of the reticle to urge andconstrain the reticle into the reticle seating position.

The above containers further comprising a plurality of members attachedto the container and moveable laterally, each member biased inwardly forconstraining the reticle in position.

The above containers further comprising a filter for pressureequalization, the filter not having filter media and having a pair ofconfronting planar surfaces separated by a gap providing a diffusionbarrier, the filter providing a pathway from the interior of thecontainer to the exterior of the container.

The above containers wherein the gap is 0.001 to 0.007 inches thick.

The above containers wherein the pathway is tortuous having a pluralityof corners and path segments.

The above containers wherein the pair of confronting surfaces are fixedto one another and are located on the top surface of the top cover.

The above containers wherein one of the pair of confronting surfaces ispart of the top cover and the other is part of the base and wherein thefilter is only operative when the top cover is seated on the base.

The above containers further comprising an addition container comprisingan additional container top portion and an additional container doorreceivable and latchable to said top portion, the additional containersized to receive the container of claim 15, whereby said container ofclaim 15 is an inner container.

The above containers wherein the additional container top portionincludes a plurality of resilient members extending downwardly on aninside surface of said top portion, and wherein said resilient membersengage the top cover of the inner container.

The above containers wherein the top cover of the inner containercomprises a plurality of vertically moveable reticle posts slidablypositioned in the cover, the posts positioned to engage the top edge ofthe reticle, and wherein the resilient members engage said verticallymoveable posts.

A container for holding reticles, the reticle having a periphery, a topsurface, a bottom surface, a side surface, four peripheral corners, atop edge and a bottom edge, the container comprising a base having aperiphery, and a top upwardly facing horizontal surface with a pluralityof spheres disposed in the base, each of the spheres positionedprimarily below the upwardly facing horizontal surface, the contactelements defining a reticle seating position, the base having anupwardly facing sealing surface at or proximate the periphery of thebase; a cover for engaging the top surface of the base plate along thebase plate periphery, thereby defining an interior for holding thereticle, the cover having a downwardly facing sealing surface forcooperating with the sealing surface of the top upwardly facinghorizontal surface of the base to create a seal therebetween when saidrespective surfaces are in contact.

The above containers wherein the sealing surface of the base and thesealing surface of the cover are both metal wherein a metal to metalseal is formed when the respective surfaces are engaged.

The above containers wherein the top cover is primarily formed of apolymer and the sealing surface of the top cover is part of a metal ringsecured to said polymer.

The above containers wherein the base has a plurality of posts fixedinto the base positioned adjacent the reticle seating position.

A above container for holding reticles in combination with a reticle,the reticle having a periphery, a top surface, a bottom surface, a sidesurface, four peripheral corners, a top edge and a bottom edge, thecontainer comprising a base having a periphery, and a top upwardlyfacing horizontal surface with a plurality of spheres disposed in thebase, each of the spheres positioned primarily below the upwardly facinghorizontal surface and extending above the surface a distance of 0.002to 0.007 inches, the contact elements defining a reticle seatingposition, the base having an upwardly facing sealing surface at orproximate the periphery of the base; a cover for engaging the topsurface of the base plate along the base plate periphery, therebydefining an interior for holding the reticle, the cover having adownwardly facing sealing surface for cooperating with the sealingsurface of the top upwardly facing horizontal surface of the base tocreate a seal therebetween when said respective surfaces are in contact.

The above combination wherein the sealing surface of the base and thesealing surface of the cover are both non-elastomeric.

A dual containment pod for reticles comprising an inner pod and an outerpod, the inner pod comprising a base and a cover that cooperates withsaid base, the inner pod having a reticle seating position therein, theouter pod comprising a container portion and a base cooperating with thecontainer portion, the outer pod sized for receiving the inner pod.

The above dual containment pods further comprising a pressureequalization means that does not have filter media.

The above dual containment pods wherein the pressure equalization meanscomprises a diffusion filter having a tortuous pathway.

The above dual containment pods wherein the reticle is positioned closeenough to the top surface of the base of the inner pod to provide adiffusion barrier to preclude particles from reaching a reticle facefacing the top surface of the base.

The above dual containment pods wherein the base of the inner podcomprises a plurality of spheres upon which the reticle seats, eachsphere primarily positioned below the top surface of said base.

The above dual containment pods wherein the spheres are comprised ofpolyamide-imide.

The above dual containment pods wherein the spheres or rotatably mountedin the base.

The above dual containment pods wherein the top cover of the inner podcomprises a plurality of vertically moveable reticle posts slidablypositioned in the cover, the posts positioned to engage the top edge ofthe reticle

The above dual containment pods wherein the top portion of the outer podcomprises a plurality of members positioned to engage the verticallymoveable reticle posts when the inner pod is seated in the outer podwith the top portion of the outer pod engaging the door.

The above dual containment pods wherein the vertically moveable postsare resiliently mounted to the top cover with a bias toward the reticlewhen the posts are displaced from their normal position.

A reticle container comprising a base and a top cover, the base having aplurality of reticle engagement members for supporting the reticle, thereticle engagement member comprised of polyamide-imide.

The above reticle containers wherein each reticle engagement member isconfigured as a sphere positioned in the top cover with a portion of thesphere below a top surface of the base.

BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 is an exploded perspective view depicting a container equippedwith a reticle support mechanism according to an embodiment of theinvention;

FIG. 2 is a partial cross-sectional side view depicting the reticlepositioning and reticle retention balls of FIG. 1;

FIG. 3 is a partial plan view depicting a pair of reticle positioningballs of FIG. 1;

FIG. 4 is a partial side view depicting a latch and load bars accordingan exemplary embodiment of the invention;

FIG. 5 is a partial side view depicting a latch and load bars accordingan exemplary embodiment of the invention;

FIG. 6 is a schematic view of the spherical projection in an embodimentof the invention;

FIG. 7 is a plan view of a contiguous pair of spherical projections inan embodiment of the invention;

FIG. 8 is a plan view of a contiguous pair of spherical projectionsformed as a monolithic structure according to an embodiment of theinvention;

FIG. 9 is a front sectional view illustrating the embedding of aspherical ball in the base according an exemplary embodiment of theinstant invention;

FIG. 10 is a sectional view illustrating a reticle resting on a pair ofcontiguous spherical projections;

FIG. 11 is sectional side view depicting an auxiliary convex projectionproviding an abutment surface to the reticle self-positioned on thespherical projections;

FIG. 12 is a plan view depicting the auxiliary convex projectionaccording to an exemplary embodiment of the invention;

FIG. 13 is a schematic illustrating the tangential contact between theedge of the reticle and the spherical projections;

FIG. 14 is a partial cross-sectional side view depicting the reticlesupported on the auxiliary convex projection on the base and contactedby the reticle retention ball on the door according to an exemplaryembodiment of the invention;

FIG. 15 is a perspective view of an assembly of a container in anembodiment of the invention; FIG. 15A depicts the detail of the retainermechanism of FIG. 15 in cross-section;

FIG. 16 is an exploded perspective view of the container of FIG. 15;

FIG. 17 is an exploded perspective view of the container of FIG. 15;

FIG. 18 is a side elevational view of an inner pod of a reticle carrieraccording to an embodiment of the invention;

FIG. 19 is an exploded perspective view of the inner pod of the reticlecarrier of FIG. 18;

FIG. 20 is a cross-sectional side view illustrating a locating pinaccording to an embodiment of the invention;

FIG. 21 is a perspective cutaway view of an inner pod in an outer podaccording to embodiments of the invention;

FIG. 22 is a perspective view of a cover of an inner pod of a reticlecarrier according to an embodiment of the invention;

FIG. 23 is a perspective view of the door or base of the inner podreticle of FIG. 18;

FIG. 24 is a perspective view of the base or door of FIG. 23 with areticle in place;

FIG. 25 is a partial plan view of the base of FIG. 24;

FIG. 26 is a cross-sectional view taken at 26-26 [sigma]f FIG. 25;

FIG. 27 is an embodiment of a spherical protrusion according to theinvention;

FIG. 28 is an embodiment of a reticle locating pin according to theinvention;

FIG. 29 is a perspective view of a rigid seal ring having a reducedfootprint in an embodiment of according to the present invention;

FIG. 30 is a cross-sectional view of a guide post in cooperation withthe rigid seal FIG. 31 is a cross-sectional view of the locating pindetail of FIG. 29;

FIG. 32 is an exploded perspective view of a dual containment podaccording to the invention;

FIG. 33 is an exploded perspective view of the pod of FIG. 32illustrating the underside of the components;

FIG. 34 is an exploded view of the top cover of a reticle pod accordingto the invention;

FIG. 35 is a perspective view of a plate forming part of a diffusionfilter according to the invention;

FIG. 36 is a perspective view of a plate forming part of a diffusionfilter with a tortuous path inset thereon according to the invention;

FIG. 37 is a top plan view of the top cover showing a diffusion filteraccording to the invention;

FIG. 38 is a perspective view of an embodiment of the invention;

FIG. 39 is a top plan view of a tortuous path diffusion filter on one ofthe sealing surfaces of a reticle pod according to the invention;

FIG. 40 is a cross section taken at line 40-40 of FIG. 39;

FIG. 41 is a schematic of a tortuous path diffusion filter suitable forthe application and according to the invention herein.

DETAILED DESCRIPTION OF THE DRAWINGS

References to relative terms such as upper and lower, front and back,left and right, or the like, are intended for convenience of descriptionand are not contemplated to limit the invention, or its components, toany one positional or special orientation. “Connect” and “engage” and“attach” and various forms of these words when used herein do notrequire direct element to element contact unless otherwise inferred orrequired by the context, intermediate linking components may be used andstill fall within the intended meaning of these words. All dimensionsdepicted in the figures may vary with a potential design and theintended use of a specific embodiment of this invention withoutdeparting from the scope thereof.

Each of the additional figures and methods disclosed herein may be usedseparately, or in conjunction with other features and methods, toprovide improved containers and methods for making and using the same,therefore, combinations of features and methods disclosed herein may notbe necessary to practice the invention in its broadest sense and areinstead disclosed merely to particularly describe representativeembodiments of the instant invention.

Referring to FIG. 1, a container 100, used for storing and transportinga reticle 110, generally includes a base 120 capable of engagement witha cover 130 to form a hermetically sealed enclosure 124 (FIG. 4)suitable for containing the reticle 110. The particular reticle depictedin FIG. 1 is generally rectangular in shape, having four corners (e.g.corner 290). Container 100 further includes a latch 140 rotativelycoupled to the door 120. Latch 140 is adapted to removably maintain theengagement between the door 120 and the cover 130 against external loadsencountered by the container 100 during shipping and transport. Reticle110 is located by and supported near each of the corners 290 on reticlepositioning members 180 mounted to the door 120. Reticle retainers 200extend from the cover 130 are brought into contact with the reticle 110upon engaging the cover 130 with the door 120 as seen in FIG. 2. Reticle110 is thus secured between the reticle positioning members 180 and thereticle retainers 200.

Reticle 110 may have a first patterned surface 210 opposite a secondchucking surface 220 spaced apart from the first patterned surface 210by a lateral surface 230. First patterned surface 210 intersects lateralsurface 230 at first and second lower pair of parallel edges 240 and 260respectively. Second chucking surface 220 intersects lateral surface 230at first and second upper pair of parallel edges 270 and 280respectively. Typically, first and second lower pair of edges 240 and260 are parallel to respective first and second upper pair of edges 270and 280, each corresponding pair of parallel edges of a surface blendswith the other corresponding pair of parallel edges at corners 290 whichmay be radiused. The patterned surface 210 may be etched with a circuitpattern (not depicted). The chucking surface 220 may be used as areference surface during the manufacture and handling of the reticle.For example, surface 220 may be held in an electrostatic chuck. Althoughthe invention is described with reference to a rectangular shapedreticle, it will be apparent to one of skill in the art that reticles ofall shapes are within the scope of the invention. Reticles may be, butare not limited to, polygonal or square shaped reticles.

Referring to FIGS. 2 and 3, and also illustrated in FIG. 1, reticlepositioning members 180 extend from base 120 on an interior surface 340of the door 120. Interior surface 340 forms a boundary of the enclosure124 formed when cover 130 engages with door 120. In one embodiment,reticle positioning members 180 comprise a plurality of substantiallyidentical projections 330 (e.g. a plurality of balls or hemispheres)each having a spherical surface 335, arranged in a regular pattern onthe interior surface 340 of the base 120. The projections 330 arelocated and dimensioned to support the reticle 110 proximate the corners290 along portions of the first and second lower pair of edges 240 and260 such that the first and second lower pair of edges 240 and 260 aredisposed in a tangential relationship to and in point contact with,spherical surfaces 335. While the container 100 may be of variousshapes, one embodiment illustrated in FIG. 1 depicts a container 100having a shape that generally conforms to the shape of the reticle 110in that it includes corners 360 on cover 130 that correspond to corners290 of the reticle 110. In this embodiment, pairs of sphericalprojections 330 are located proximate each corner 360 of base 120 withreticle 110 being positioned inside enclosure 124 so as to contactspherical surfaces 335 such that corners 290 are disposed in substantialalignment with the corners 360 on cover 130, as depicted in FIGS. 1 and3.

Also, as depicted in FIGS. 2, 3, 6-10 and 13, each pair of sphericalprojections 330 is positioned and/or mounted so that each sphericalprojection 330 is located adjacent to each other on either side of oneof the two diagonals 332 (dotted in FIG. 1) extending between pairedcorners 290 on base 120 of container 100. The projections may be formedby spherical balls 330 embedded in the base 120, as illustrated in FIG.9 for example, and presenting a spherical surface 335 or they may beformed by convex surfaces 336 depicted in FIGS. 6, 7, 8 and 10. Theconvex surfaces may be integrally formed with the container. In thisconfiguration, each contiguous pair of spherical balls 330 presentscomplementary portions 337 of spherical surfaces 335 that generallyincline towards an interior of enclosure 124 and towards interiorsurface 340.

Taken together, the complementary portions 337 constitute a reticlelocating and positioning structure wherein a reticle 110 is positionedon the spherical projection 330 with the patterned surface 210 facinginterior surface 340. By aligning corners 290 substantially with thecorners 360 on cover 130 of container 100, placement of the reticle 110onto the reticle positioning members 180 cause the reticle 110 toself-align and be retained within the reticle positioning members 180.First and second lower (upper)) pair of edges 240 (270) and 260 (280)are thereby disposed substantially planar and parallel to interiorsurface 340. In this configuration, each of first and second lower(upper) pair of edges 240 (270) and 260 (280) are placed in pointcontact along a tangent 338 at complementary portions 337 of sphericalsurfaces 335, best depicted in FIG. 13. A radius (R) 390 of sphericalballs 330 is selected to keep the reticle 110 at a predefined heightabove interior surface 340, as depicted in FIG. 2. Surface 340 andreticle 110 thereby define a diffusion barrier 400 between the reticleand the door. The diffusion barrier 400 is sized to inhibit or present abarrier to the diffusive flow of particles into the diffusion barrier400, thereby causing the particles to take alternate paths away from thepatterned surface of the reticle.

Three dimensional geometries may be utilized in place of the sphericalprojections 330 to effect the same positioning function while makingonly point contact with the reticle 110. For example, a cone or frustumgeometry will engage the lower pair of edges 240 and 260 and provideonly point contact. Other geometries may become evident to the skilledartisan.

Reticle retainers 200 are mounted on or otherwise extend from the cover130, as illustrated in FIGS. 1 and 2. As can be seen in thecross-sectional side view of the container 100 of FIG. 2, each reticleretainer 200 comprises a spherical retainer projection 410, which may bea ball, with a spherical bearing surface 420. Upon engaging the cover130 with the door 120, a portion of the spherical bearing surface 420 isbrought into forced contact with chucking surface 220 at a point 430 onthe chucking surface 220, best depicted in FIG. 14. In one embodiment,each point 430 is located so that the line of action of the forceexerted by the chucking surface 420 at the point 430 passes through oneof the diagonals 332 of the container 100 so as to prevent asymmetricloading of the reticle, which might cause the reticle to tilt up fromthe reticle-positioning members 180. Reticle 110 is thereby rigidlysecured between the reticle-positioning members 180 and the reticleretainers 200 when the cover 130 is brought into engagement with thedoor 120.

Spherical projection 330 and spherical retainer projection 410 may bemanufactured from low particulate generating material and press fit intotheir respective locations on the door 120 and cover 130. In anexemplary embodiment of the invention, spherical projection 330 andretainer balls 140 can be the type of spherical balls found in theraceway of a ball-bearing, for example. In yet another embodiment,spherical projections 330 or retainer projections 410 may be configuredto rotate about one or more axes passing through the centers of theballs, thereby causing the balls to rotate upon being contacted by anyportion of the reticle. Such an arrangement may reduce particulategeneration arising from abrasion attendant sliding friction between thereticle positioning members 180 or reticle retaining members 200 and thereticle 110. In such an arrangement, an additional bottom surfaceengaging projection 333 (dotted in FIG. 12) may be appropriate thatengages the edge rather than the side surface of the reticle. Anotheraspect of the invention is depicted in FIG. 1. A plurality of verticalposts 440 are mounted to or otherwise project from the door 120. Thecover 130 cooperates with the vertical posts 440 to register the cover130 to door 120, enabling repeatable and non-sliding contact betweenspherical bearing surfaces 420 and chucking surface 220 at points 430.

Once the cover 130 is engaged with door 120, the latch 140 is actuatedto maintain the engagement between the door 120 and the cover 130.Referring again to FIGS. 1, 4 and 5, there is an illustration of aperspective and side views of embodiments that utilize two “U” shaped,resilient load bars 460 rotatively coupled to door 120 and spaced fromeach other. Rollers 470, 480 and a hand-graspable tab 490 may beprovided on each “U” shaped load bar 460. The resilient load bars 460may be kinematically coupled (not depicted) to allow synchronousrotation whereby the load bars 460 may rotate in union but in opposingdirections.

In operation, cover 130 is engaged with door 120 and using tab 490 oneor both load bars 460 are rotated until rollers 470, 480 are positionedover and in contact with cover 130, as portrayed in FIG. 4. Load bars460 and rollers 470, 480 are shaped and dimensioned to locate rollers470, 480 so as to apply a compressive force on cover 130 along a line oraxis 431 passing through contact points 430 between spherical bearingsurfaces 420 and chucking surface 220. With this arrangement, the loadbars 460 provide uniform closure force and locate clamping forcedirectly over spherical retainer balls 410. In other embodiments, otherlatching mechanisms may provide damping force directly on the region ofthe cover corresponding to the engagement of the reticle by the retainerprojection 410.

In an alternate embodiment depicted in FIGS. 11, 12 and 14, the base isequipped with at least one auxiliary projection 331 disposed proximatespherical projection 330. The convex projection 331 has a distal end 334that provides an abutment to the patterned surface 210 after reticle 110is in equilibrium with reticle positioning members 180, therebyconstraining reticle 110 to lie on a plane 341 (FIG. 14) defined by thedistal ends 334 of the convex projections 331 that is substantiallyparallel to interior surface 340 of door 120.

Referring to FIGS. 15, 15A 16 and 17, another embodiment of a reticlecontainer 500 according to the invention is depicted. A door or base 502and a cover 504 cooperate to form an enclosure 506. A plurality ofreticle positioning members 508 are mounted on a surface 510 of door502. Reticle positioning members 508 may comprise a plurality ofsubstantially identical spherical balls 512 arranged in a regularpattern (not depicted) on the surface 510 and dimensioned to support areticle 514 substantially parallel to surface 510 by contactingperipheral, non-functional portions of the surface 510 proximate corners516 of container 500. Reticle retainers 518 are mounted on the cover504.

As depicted in FIG. 15 A, each reticle retainer 518 comprises aspherical retainer ball 520 attached to the cover 504 by a spring clampor spring cushion 522. Upon engaging the cover 504 with the door 502,spherical retainer ball 520 is brought into contact with a chuckingsurface 524 on the chucking surface deforming spring clamp 522 along avertical direction. Spring clamp 522 is configured so that it deflectsmore in the vertical direction than it does in the horizontal direction.Once the cover is mated to the door and the latch engaged, the springclamp 522 prevents relative sliding between the surfaces even when thecontainer is subject to shock and vibration loading. Reticle 514 isthereby securely retained between reticle positioning members 508 andreticle retainers 518 with only point contact between reticle 514 andthe reticle retainers 518. Spherical balls 512 and spherical retainerballs 520 may be manufactured from low particulate generating materialand press fit into their respective locations on the door 502 and cover504.

The spherical balls and projections depicted in the various embodiments(e.g. 330, 331, 410, 512 and 520) may be manufactured from a lowparticulate generating material. In an example embodiment, the lowparticulate generating material is a polyamide-iniide (PAD, a reactionproduct of trimellitic anhydride and aromatic diamines. PAI is called“amide-imide” because the polymer chain comprises amide linkagesalternative with imide linkages.

One such PAI is sold under the brand name TORLON, is a registeredtrademark of Solvay Advanced Polymers. TORLON is a high performanceamorphous (noncrystalline) engineering thermoplastic. The combination ofaromatic groups and imide linkages are responsible for the polymer'sexceptional thermal stability. The amide groups impart flexibility andelongation, which results in an engineering plastic with exceptionaltoughness. TORLON is the highest performing melt processable plastic. Ithas superior resistance to elevated temperatures, capable of performingunder severe stress conditions at continuous temperatures to 500.degree.F. (260.degree. C.). Parts machined from TORLON stock shapes providegreater compressive strength and higher impact resistance than mostadvanced engineering plastics. Its relatively low coefficient of linearthermal expansion and high creep resistance provide dimensionalstability over a wide use range.

TORLON is an amorphous material with a glass transition temperature (Tg)of 537.degree. F. (280.degree. C.). TORLON 4301 (Bearing Grade),supplied by Boedeker Plastics, Inc. of Texas USA, may be advantageouslyused in an exemplary embodiment of the invention. TORLON 4301 extrudedPAI is primarily used for wear and friction parts. It offers a very lowexpansion rate, low coefficient of friction and exhibits little or noslip-stick in use. The flexural modulus of TORLON 4301 is 1,000,000 psi,higher than many advanced engineering plastics. This grade excels insevere service wear applications such as non-lubricated bearings, seals,bearing cages and reciprocating compressor parts.

Other grades and compositions of polymers that are structurally similarto PAI may be used without departing from the scope of the invention. Inparticular, TORLON exhibits relatively low particulate generationensuring that the environment 132 within the EUV pod 100 is maintainedsubstantially particulate free. Such an arrangement significantlyeliminates almost all particulate generation arising from abrasion dueto sliding friction between the reticle positioning/retaining membersand the reticle.

TORLON is injection moldable but nonconductive. In embodiments wherestatic dissipation is required, a static dissipative reinforcedpolyamide-imide material such as SEMITRON (e.g. SEMITRON ESd 520HR) maybe advantageously used. SEMITRON is a trademark of Quadrant EngineeringPlastics Products. One of skill in the art will recognize that otherengineering polymers with a structure and/or properties similar to thatof TORLON may also be advantageously used.

In another exemplary embodiment of the invention, spherical balls 512and retainer balls 520 may be fabricated from a metal, such as stainlesssteel. Materials suitable for use in the race of a ball bearingassembly, for example, are candidate materials because of theirrelatively high resistance to wear, hi yet another embodiment, sphericalballs 512 and/or retainer balls 520 may be mounted to the door and/orcover so as to be rotatable about one or more axes passing through thecenters of the balls thereby causing the balls to rotate upon beingcontacted by any portion of the reticle. Such an arrangement mitigatessliding friction between the reticle positioning/retaining members 508,518 and the reticle 514.

Referring to FIGS. 18 through 26, embodiments depicting other aspects ofthe invention are illustrated. A container 1099, depicted in phantom, isan outer package or pod, configured, for example, as a reticle SMIF podcontainer such as is illustrated in U.S. Pat. Nos. 6,513,654; 6,216,873;and 6,824,916. Said patents are owned by the assignee of the instantapplication and are hereby incorporated by reference herein in theirentirety. Rather than holding a reticle, the assembly holds an inner podor cassette 1100 which then holds for storing and transporting a reticle(or mask) 1110, such as an EUV reticle, and generally includes a door1120 (interchangeably referred to as the base of the pod) capable ofengagement with a cover 1130 to form a sealed enclosure 1132 suitablefor containing the reticle 1110. In FIGS. 19 through 21, the cover 1130seals to the base 1120 by way of a rigid seal ring 1133 that engages thesealing surface 1135 of the base 1120. The rigid seal ring may besecured to the cover by threaded fasteners 1136, such as for example capscrews, that are peripherally disposed adjacent an outer edge 1139 ofthe cover 1130.

An exploded view of the FIG. 18 embodiment is depicted in FIG. 19. Thereticle 1110 is depicted as substantially rectangular in shape with afirst surface 1210 opposite a second surface 1220 spaced apart from thefirst surface 1210 by a lateral surface 1230. The first surface 1210intersects lateral surface 1230 at first and second lower pair ofparallel edges 1240 and 1260 respectively. Second surface 1220intersects lateral surface 1230 at first and second upper pair ofparallel edges 1270 and 1280 respectively. In a typical rectangularshaped reticle, first and second lower pair of edges 1240 and 1260 areparallel to respective first and second upper pair of edges 1270 and1280, each corresponding pair of parallel edges of a surface blends withthe other corresponding pair of parallel edges at radiused corners 1290.In an alternate embodiment, the first surface 1210 may be etched withthe desired circuit pattern (not depicted) and the second surface 1220may be used as a reference surface during the manufacture and handlingof the reticle. For example, surface 1220 may be held in anelectrostatic chuck. The reticle 1110 may be located and supported neareach of its corners on reticle contact members 1350 mounted to the door1120. The reticle contact members 1350 may be mounted to the door 1120in a manner known in the art. Although the invention is described withreference to a square shaped reticle, it will be apparent to one ofskill in the art that a reticle of other shapes such as for example, arectangular, polygonal or circular shaped reticle, may be used withoutdeparting from the scope of the invention. The illustrated embodiment ofFIG. 19 depicts a container 1100 having a shape that generally conformsto the shape of the reticle 1110 in that it includes corners 1160 thatcorrespond to radiused corners 1290 of the reticle 1110. However, one ofskill in the art will readily recognize the container 1100 may haveother shapes such as for example, a rectangular, polygonal or a circularshape without departing from the scope of the invention.

In FIGS. 19 and 23, an inner pod door or base 1120 according to anembodiment of the invention is depicted. Base 1120 generally conforms tothe shape of the reticle and includes a base plate 1300 with opposedfirst and second major parallel surfaces 1305 and 1306 and radiusedcorners 1345. Patterned surface 1210 of the reticle 1110 may be disposedfacing major surface 1305. Base plate 1300 includes a continuous contactsealing surface 1135 near the perimeter of first major surface 1305.Generally, the entire first major surface 1305 may be provided with auniform surface finish. Alternatively, the sealing surface 1135 isprovided with a first surface finish 1320 and the remaining portion ofthe first major surface 1305, which is exposed to the interior of theenclosure 1132 formed when cover 1130 engages with base 1120, ischaracterized by a second surface finish 1325.

As depicted in FIGS. 19 and 24 through 26, reticle guides 1330 aremounted to inner pod door or base 1120 on the first major surface 1305.Reticle guides 1330 comprise a plurality of substantially identicalposts 1310 fixedly attached to the door 1120 on base plate 1300 andextending outwardly from the first major surface 1305 to terminate at apost-end portion 1335. In certain embodiments, post-end portions 1335are shaped so as to present a tapered surface 1340 sloping so as topresent a substantially frusto-conical shape with an apex proximate thepost-end portion 1335. The posts 1310 having the tapered surfaces 1340are arranged in a regular pattern on the surface 1305 and dimensioned torestrain the reticle 1110 proximate its corners 1290 along portions ofthe first and second lower pair of edges 1240 and 1260 such that thefirst and second lower pair of edges 1240 and 1260 may be disposed in atangential relationship to and in point contact with the taperedsurfaces 1340 such that radiused corners 1290 of the reticle 1110 aredisposed in substantial alignment with the radiused corners 1345 of thebase plate 1300 as illustrated in FIGS. 19 and 23.

It will be readily evident to one of skill in the art that otherconfigurations of reticle guides 1330 with tapered surfaces 1340 may beused in place of the posts 1310. In particular, spherical balls such asfor example, a spherical ball bearing with a spherical surface arrangedso that the spherical surfaces contact the reticle 1110 in the manner ofthe tapered surfaces 1340 of the posts 1310 may be advantageously usedwithout departing from the scope of the invention as illustrated inFIGS. 1-4. The posts 1310 may be of metal, for example steel oraluminum, or may be of other rigid materials, including polymers.

As depicted in FIGS. 19 and 23 the posts 1310 are mounted so that eachpost 1310 is located adjacent to each other on either side of one of twodiagonals 1302 and 1304 extending between paired corners 1360 ofcontainer 1100. In this configuration, each contiguous pair of posts1310 presents complementary portions of tapered surfaces 1340 thatgenerally incline towards an interior of enclosure 1132 and towardssurface 1305 of the base plate 1300.

Taken together, the complementary portions of the tapered surfaces 1340constitute a reticle locating and positioning structure, as depicted inFIGS. 24 through 26. The reticle 1110 is positioned on the posts 1310with the patterned surface 1210 facing surface 1305, with radiusedcorners 1290 substantially alignment with the corners 1345 of container1100. The reticle will self-align so as to be retained within the posts1310 with first and second lower (upper) pair of edges 1240 (1270) and260 (1280) disposed substantially planar and parallel to surface 1305.In this configuration, each of first and. second lower (upper) pair ofedges 1240 (1270) and 1260 (1280) are placed in tangential engagementand in point contact with complementary portions of the tapered surfaces1340.

In the embodiment of FIGS. 18 through 26, the plurality of reticlecontacts 1350 are in the form of a spherical balls or protrusions 1355,one between each pair of posts 1310. The FIG. 19 and FIG. 23 depictionsportray the protrusions 1355 as being located on the diagonals 1302 and1304, equidistant between the reticle guides 1330. However, the locationof the protrusions 1355 may be located differently to avoid contact withsensitive portions of the patterned surface 1210.

Referring again to FIG. 26, a radius 1390 of each mask contact 1350 isselected to suspend the patterned surface 1210 of the reticle 1110 at apredefined height 1400 above major surface 1305 of the base plate 1300and creating a gap 1402 thereby. AU of the mask contacts 1350 may extendabove interior surface 1305 at substantially the same height 1400 todefine a plane 1341 that is substantially parallel to interior surface1305. The gap 1402 may be dimensioned to define a diffusion layer ordiffusion barrier between the reticle and the door. The diffusionbarrier inhibits particles from migrating into the gap 1402, causing theparticles to take alternate paths remote from the patterned surface ofthe reticle. A representative and non-limiting height 1400 of gap 1402is in the range of 0.001- to 0.010-in.

In the embodiment of FIGS. 18 through 26, the plurality of reticlecontacts 1350 are in the form of a spherical balls or protrusions 1355,one between each pair of posts 1310. The FIG. 19 and FIG. 23 depictionsportray spherical protrusions 1355 as being located on the diagonals1302 and 1304, equidistant between the reticle guides 1330. However, thelocation of the spherical protrusions 1355 may be located to avoidcontact with sensitive portions of the patterned surface 1210. Forexample, spherical protrusions 1355 may be located near the midspan ofthe edge pairs 1240 and 1260. A three point contact could also beimplemented for stable mounting of reticle 1110 and adequate definitionof plane 1341.

Referring to FIG. 27, an embodiment wherein the spherical balls orprotrusions 1355 are mounted from the back side (surface 1306) of baseplate 1300 is depicted. A cavity 1404 is formed having major access fromthe back side 1306 of base plate 1300, and defining a spherical apex1408 that breaks through the major surface 1305. The break through iscontrolled to form an aperture 1410 that has a predetermined diameterthat is smaller than spherical ball 1355. The spherical ball 1355 isseated within aperture 1410, so that a portion protrudes above the majorsurface 1305 to establish the height 1400 of the gap 1402. The sphericalball 1355 is held in place by a set screw 1412 and the height of theball extends above the major surface may be minutely adjusted byrotation of the set screw.

Another aspect of the invention is best described by reference to FIGS.19 through 21. The cover 1130 includes an outer surface 1410 opposite aninner surface 1420 separated from the outer surface 1410 by a thickness1425. The inner surface 1420 is in communication with the sealedenclosure 1132 whenever the cover 1130 is in engagement with the poddoor or base 1120. Cover 1130 may be configured with one or more bores1430, each passing through the thickness 1425 of the cover 1130. Thebores 1430 are disposed spaced apart from each other at preciselocations 1440 on the cover inboard of the threaded fasteners 1136 anddistally of the outer edge 1139 of the cover 1130.

The illustration of FIGS. 20 and 21 depict a locating pin 1450dimensioned for a clearance fit within bore 1430 and extending along anactuation axis 1432 that is substantially perpendicular to the outersurface 1410. The locating pin 1450 comprises a shaft portion 1452having a first end 1460 and a tapered portion 1462 having an opposedsecond end 1465. The shaft portion 1452 is characterized by asubstantially uniform cross-section along its length and extends throughthe bore 1430 such that first end 1460 remains outside the sealedenclosure 1132 and is proximate outer surface 1410. Tapered portion 1462is disposed within the sealed enclosure 1132 and is characterized by asloped surface 1475 that narrows to a radiused apex 1480 at the secondend 1465 adjacent the reticle 1110. Tapered portion 1462 may take on oneof several three dimensional shapes, such as a cone, frustum or pyramid.Also, tapered portion need not be axisymmetric, and instead may providea taper only on the surface facing reticle 1110.

In one embodiment, the tapered locating pin 1450 is attached at thefirst end 1460 to a resilient member 1478 which remains on the outersurface 1410. Resilient member 1478 is configured to bias the taperedlocating pin 1450 in a normally refracted position with the second end1465 located within the sealed enclosure proximate the inner surface1420 and a deployed position with the second end 1465 located within thesealed enclosure but remote from the inner surface 1420. In an exemplaryembodiment, the resilient member 1478 is a disk shaped elastomer whichforms a seal between the outer surface 1410 and the clearance betweenthe tapered locating pin 1450 and the bore 1430 to prevent incursion ofparticulates into the sealed enclosure 1132.

Reticle posts 1310 as well as mask contacts 1350 and tapered portions1457 of locating pins 1450 may be manufactured from low particulategenerating material such as stainless steel or TORLON (discussed above).Reticle posts 1310 and mask contacts 1350 may be press-fit into theirrespective locations on the base plate 1300.

The FIG. 21 embodiment further depicts an outer package 1500 that abutsthe outer surface 1410 of the cover 1130. The outer pod 1500 has a cover1507 and a door or base 1509. This is the dual pod concept with theinner package that hold the mask and the outer package that holds andsecures the inner package. The outer package is used for snipping andthe inner pod will be removed and used inside the clean room for thelife of the reticle. The outer package 1500 is provided with a structurethat includes a plurality of pads 1503, positioned centrally on eachside of the reticle seating position and a plurality of pads 1504positioned to engage the top surface of the inner pod cover 1130. Theplurality of pads 1504 are adapted to contact the resilient members 1478and exert a downward force on the first end 1460 of the tapered locatingpins 1450 to cause them to travel downward until the sloping surface1475 of each locating pin 1450 contacts at least one of first and secondupper pair of edges 1270 and 1280 of the reticle 1110 at a contactlocation 1525. At each contact location 1525 (FIG. 19), the taperedsurface 1475 exerts a horizontal bias 1580 in the plane of the secondsurface 1220 and directed towards the reticle and a vertical bias 1585directed towards the first surface 1210. The number of locating pins1450 and the locations of the bores 1430 are preferably selected so thata pair of tapered surfaces 1475 contacts a corresponding upper pair ofedges 1270 and 1280 only at diametrically opposed locations providingaccurate and secure horizontal positioning, as evidenced by thepositions of the resilient members 1478 in FIG. 19.

In operation, the cross-section of tapered portion 1462 of locating pin1450 tangentially contacts one of the upper pair of edges 1270 and 1280(FIG. 19), providing minimal contact between the reticle 1110 andlocating pin 1450. The resultant of the vertical biases 1585 acts toconstrain the movement of the reticle relative to the door. One of skillin the art will readily recognize that other cross-sectional shapes,such as for example, a square, a triangle or a polygon may beadvantageously employed together with a bore having a matchedcross-section without departing from the scope of the invention.

The embodiments of FIGS. 28, 32 and 33, utilize locating pins 1450 andreticle posts 1310 located just outside the footprint of reticle 1110.

Functionally, the reticle posts 1310 serve only to guide reticle 1110onto the spherical protrusions 1355 Actuation of locating pins 1450 willcenter reticle 1110 on the base plate 1300. If reticle 1110 is incontact with one or more reticle posts 1310, the centering operationwill translate the reticle 1110 away from reticle posts 1310, leaving agap 1312 between reticle 1110 and reticle post 1310. In thisconfiguration, tapered surface 1340 be located higher than facepatterned face 1210 of reticle 1110.

Referring again to FIGS. 18 through 21, cover 1130 is provided with aseal-ring 1133 disposed on the surface 1420 proximate an outer edge 1605of the cover 1130. The seal-ring 1133 has a seal contact surface 1610having a surface finish that may be substantially identical to thesurface finish 1320 of the sealing surface 1135. Furthermore, surface1420 is located so that when the cover 1130 is mated to the door 1120,the seal-contact surface 1610 engages the rigid sealing surface 1135 tocreate a seal. The two surfaces are kept in contact by adhesionmechanisms that include one or more of capillary, electrostatic, and vander Waals attractive forces and hydrogen bonding, hi a generalembodiment of the invention, the entire first major surface 1305 may beprovided with a uniform surface finish. Alternatively, the sealingsurface 1135 is provided with a first surface finish 1320 and theremaining portion of the first major surface 1305 may be characterizedby a second surface finish 1325. The seal-contact surface 1610 and thesealing surface 1135 maybe aluminum with, for example, an electro lessnickel finish. Generally, a surface finish with a roughness average (RA)of up to 0.50 micro inches is acceptable with the preferred range beingfrom 0.20-0.40 RA. The surface finish may be obtained through lapping orpolishing or other methods known in the art. The seal-ring 1133 maybe ametal band that is laser welded or otherwise adhered or attached to theinside surface of the cover.

A process for assembling the door 1120 includes lapping or polishing themajor surface 1305 to a prescribed flatness and finish specification,followed by forming post cavities on the major surface 1305 dimensionedfor an interference fit with posts 1310 and forming cavities on the backside 1306 of the base plate 1300 for housing the mask contacts 1350. Forthe embodiment of FIG. 28, spherical balls 1355 are utilized for themask contacts 1350. Accordingly, the cavities for housing the maskcontacts 1350 are formed to just break the surface 1305 and create theaperture 1410 of a predetermined diameter that permits only a portion ofthe spherical balls 1355 to extend above the surface 1305 and at theprescribed height 1400. Thereafter, the posts 1310 are press fit intothe base plate 1300 and the spherical balls 1355 are secured in placewith set screws 1412.

Referring to FIGS. 29 through 36, an embodiment of the invention havinga rigid seal ring 1650 of reduced footprint is portrayed. Rigid sealring 1650 may be mounted to a cover 1652 as previously presented. Cover1652 may include locating pins 1450 as previously disclosed. Rigid sealring 1650 includes a mounting face 1654, a sealing face 1656, an innerperimeter face 1658, and a plurality of mounting face recesses 1660 andsealing face recesses 1662. Mounting face recesses 1660 are formed onthe mounting face 1654 and the inner perimeter face 1658 and are sizedto accommodate locating pins 1450 without contact. Sealing face recesses1662 are formed on the sealing face 1656 and the inner perimeter 1658and are sized to accommodate reticle posts 1310 without contact.

Functionally, locating pins 1450 operate within mounting face recesses1660 and, when cover 1652 is placed over a base 1664, reticle posts 1310are housed within recesses 1660. The cooperation of components 1450 and1310 with the recesses 1660 and 1662 enable rigid sealing ring 1650 tohave a reduced dimension 1666 while maintaining the integrity of therigid seal arrangement. The overall plan dimensions of cover 1652 andbase 1664 may also be reduced, enabling a more compact overall design.

Referring to FIGS. 34, 35, 36, and 37, another feature of particularembodiment is illustrated. Outer surface 2410 of cover 1130 may beconfigured with a serpentine rib and a plate 1705 is laser welded overit to form a groove or microchannel 1700, schematically shown in FIG.37. MicroChannel 1700 connects the external environment to the internalenclosure 1132 within the container through entry ports 1725 and exit1730 that lead into the interior of the pod. The groove preferably aboutfrom 0.002 to 0.004 inches deep with a repeating pattern of channelssegments 1710, 1715, 1717 and 1718 interconnected to each other topresent sharp bends to the diffusive flow of a particle through thegroove. Each channel is generally about 0.25 to 0.75 inch in width andseveral inches long. The microchannel provides a diffusion barrieragainst the migration of particles from the external environment intothe internal enclosure but allows equalization of pressure between theinside and outside of the container. The micro channel 1700 may also beformed by creating an appropriately dimensioned channel on the plate1705 and affixing the plate to the top surface of the upper shellportion 1131 of the top cover 1130 so that it forms the microchannel1700 to create the diffusion filter or a small gap filter. The filtermechanism is based on the concept that the particles will be attractedto the walls of the channel before entering the carrier and thereforewill not make it into the inner sealed environment. This channel alsoprovides pressure equalization between the interior and exteriorenvironment of the EUV pod or container 100. The efficiency of thisfilter maybe measured using the Frazier Porosity (or Frazier number),cfm/ft2 @ 0.5 in. H20 delta-P of air transmitted through the barrierfilter as detailed, for example, in ASTM D737. The container 100 (i.ethe EUV pod) will stay in a vacuum environment most of the time.However, it may be moved to an atmospheric clean room environment if themask needs cleaning or replacement. Under such circumstances a slowacting filter—i.e. one with a low Frazier number is desirable so thatthe velocity of air across it is very low. Typically, the Frazier numberis less than or equal to 0.28 cubic feet per minute @ 0.5″ H20 persquare foot of filter media.

Referring to FIGS. 38 through 41, an alternate embodiment implementingof the tortuous diffusion filter concept is illustrated. A reticlecontainer 1800 having a base or door 1802 and a cover 1804 cooperate toform an enclosure 1806. A substantially flat and continuous ledge orperipheral portion 1808 is located on the upper face of and near theperimeter of door 1802. The cover 1804 likewise has a fiat andcontinuous ledge or peripheral portion 1810. The respective peripheralportions 1808 and 1810 are dimensioned such that, upon mating cover 1804with door 1802 and engaging the door latch 1812, the peripheral portion1808 sealingly abuts with peripheral portion 1810. A tortuous channel1816 may be formed on the surface either peripheral portion 1808 or1810.

The tortuous path 1816 may take the form of a narrow, serpentine channelthat connects the external environment of the container to the interiorof the container when the door and cover are engaged. In the embodimentof FIG. 39, the tortuous channel 1816 includes a repeating pattern ofsegments 1818, 1820, 1822 and 1824 connected in series. Each segment mayhave a depth into the face of peripheral portion 1808 or 1810 of about0.002- to 0.004-in. and the shortest segment (i.e. segment 1820) mayhave a length of about 0.25-in. The total number of segments may bearranged so that a particle entering the channel at 1826 may have totraverse a path of at least 6-in. before entering the container at 1828.The foregoing dimensions are offered as representative and are not to beconstrued as limiting.

Particles migrating into tortuous channel 1816 tend to hit the walls ofthe tortuous channel 1816 and collect inside the channel rather thandiffusing through the channel into the enclosure 1806. Accordingly,tortuous channel 1816 presents a diffusion barrier or diffusion filteragainst particle infiltration while providing a means for the pressureinside the enclosure 1806 to equalize with the pressure outside theenclosure.

Referring to FIG. 41, another embodiment of the tortuous path concept isdepicted. A tortuous passage 1830 is characterized by a repeatingpattern of major length segments 1832 and 1834 joined by minor lengthsegments 1836 and 1838, interconnected substantially at right angles toeach other to present sharp bends to the diffusive flow of a particlepassing therethrough. Each of the segments 1832, 1834, 1836 and 1838extend past the junctions with the respective downstream segment to forma plurality of particle trap segments 1840.

Each particle trap segment 1840 is a “blind alley” that causes anyparticle flowing into it to drop out of the flow within the segment 1840rather than navigate the bend into the neighboring segment.

One of skill in the art will readily recognize that other materials,surface treatments and contact areas may be used to obtain the surfaceadhesion effects and thereby provide a seal without the use of aparticle generating elastomeric seal. For example, a comparable seal maybe obtained by mating polymers, glass, ceramic and metals to create theseal ring of the invention. It is also understood that specificillustrated features of the reticle pods herein are also advantageousand applicable to wafer carriers and other substrate carriers. Forexample the diffusion filters would be suitable for wafer containers,polyamide-imide would be very suitable for contact areas of wafers andmachine interfaces in wafer containers such as FOUPS and FOSBS (acronymsfor front opening unified pod and front opening shipping boxrespectively).

The container embodiments presented herein or portions thereof may bemade from an electrostatically dissipative material, thereby preventingdamage to the reticle stored and transported therein.

Because various modifications, substitutions, and changes of thisinvention may be made by one of skill in the art without departing fromthe spirit thereof, the invention is not limited to the embodimentsillustrated and described herein. Rather, the scope of the invention isto be determined by the appended claims and their equivalents.

1-45. (canceled)
 46. A container for holding reticles, the reticlehaving a periphery, a top surface, a bottom surface, a side surface,four peripheral corners, a top edge and a bottom edge, the containercomprising: a base having a periphery, and a top upwardly facinghorizontal metal surface with a plurality of contact elements extendingupwardly, for engaging the reticle on the bottom surface, the base platefurther having a plurality contact elements for seating the reticle, theupwardly facing horizontal surface further having a sealing surfaceextending around the base at or proximate to the periphery of said base;a cover for engaging the top surface of the base plate along the baseplate periphery, thereby defining an interior for holding the reticle,the cover having a downwardly facing horizontal planar metal sealingsurface for cooperating with the metal sealing surface of the topupwardly facing horizontal metal surface of the base to create a sealtherebetween when said respective surfaces are in contact.
 47. Thecontainer of claim 46 wherein the top surface of the base iscontinuously planar and integral from the sealing surface to below thereticle seating position of the reticle thereby forming a diffusionbarrier.
 48. The container of claim 47 wherein the downwardly facinghorizontal planar sealing surface has a nickel finish by there sealbetween the base and cover is metal to metal.
 49. The container of claim46 wherein the base is formed primarily of metal.
 50. The containersystem comprising the container of claim 46 and further comprising anouter cover and a door receivable within the outer cover to define aninterior, the outer cover and outer base sized to receive the containerof claim
 46. 51. The container of claim 46 wherein the cover comprises aplurality of vertically moveable reticle posts positioned in the cover,the posts positioned to engage the reticle.
 52. The container of claim51 wherein the each of the moveable reticle posts are resilientlypositioned in the cover.
 53. The container of claim 50 wherein the covercomprises a plurality of vertically moveable reticle posts positioned inthe cover, the posts positioned to engage the reticle.
 54. The containerof claim 47 wherein there is a gap between a reticle in place on thebase and the top surface of the base and the gap is 0.001 to 0.007inches thick.
 55. The container of claim 46 wherein the top surface ofthe base and the downwardly facing horizontal planar metal sealingsurface of the cover each have a surface finish with a roughness average(RA) of up to 0.50 micro inches.
 56. The container of claim 46 whereinthe top surface of the base and the downwardly facing horizontal planarmetal sealing surface of the cover each have a surface finish with aroughness average (RA) of between 20-0.40 micro inches.
 57. Thecontainer of claim 50 wherein the additional container top portionincludes a plurality of resilient members extending downwardly on aninside surface of said top portion, and wherein said resilient membersengage the top cover of the inner container.
 58. The container of claim46 wherein the top cover is primarily formed of a polymer and thesealing surface of the top cover is part of a metal ring secured to saidpolymer.
 59. A dual containment pod for reticles comprising an inner podand an polymer outer pod, the inner pod comprising a base and a coverthat cooperates with said base, the inner pod having a reticle seatingposition therein, the outer pod comprising a container portion and abase cooperating with the container portion, the outer pod sized forreceiving the inner pod, and wherein the cover has a plurality ofapertures and comprises a plurality of vertically moveable memberspositioned in the apertures and resiliently connected to the cover, thevertically movable members resiliently movable downwardly for engagingthe reticle when the inner pod is enclosed in the outer pod byengagement of the inner pod cover by the outer pod cover, the cover andbase of the inner pod each having cooperating metal sealing surfaces.60. The container of claim 59 wherein the cooperating metal sealingsurfaces of the base and cover each have a surface finish with aroughness average (RA) of between 20-0.40 micro inches.
 61. The dualcontainment pod for reticles of claim 59 wherein the base iscontinuously planar and integral from the sealing surface to below thereticle seating position of the reticle
 62. A dual containment pod forreticles comprising an inner pod and an polymer outer pod, the inner podcomprising a base and a cover that cooperates with said base, the innerpod having a reticle seating position therein, the outer pod comprisinga container portion and a base cooperating with the container portion,the outer pod sized for receiving the inner pod, the cover and base ofthe inner pod each having cooperating planar metal sealing surfaces. 63.The dual containment pod for reticles of claim 62 wherein the base iscontinuously planar and integral from the sealing surface to below thereticle seating position of the reticle.
 64. The container of claim 62wherein the cooperating planar metal sealing surfaces of the base andcover each have a surface finish with a roughness average (RA) ofbetween 20-0.40 micro inches.